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Scenera, which is developing proprietary semiconductor metrology and inspection solution, concluded its POC, with results exceeding expected performance goals.
POC Results 09/2025
Scenera Technologies has successfully completed its proof-of-concept (POC) for a proprietary optical system designed for high-precision 3D metrology in semiconductor inspection. The POC focused on evaluating the system’s resolution and dynamic range for demanding metrology applications such as wafer warpage and micro-bump applications. Comparing systems’ performance with 3rd party measurements, Scenera was able to reproduce the results typically within 1-2 nanometer accuracy. Despite limitations typical of early-stage prototypes, such as basic optics and alignment constraints—the POC validated the core technology and outlined a clear path toward achieving 1 nm resolution and tens of microns dynamic range. These findings confirm the feasibility and scalability of Scenera’s approach for advanced semiconductor metrology.
The company has initiated discussions with OEM companies exploring potential strategic collaborations.
For more information: info@scenefatech.com